Modification of uv absorption profile of polymer film reflectors to increase solar-weighted reflectance

ABSTRACT

Provided are reflective thin film constructions including a reduced number of layers, which provides for increased solar-weighted hemispherical reflectance and durability. Reflective films include those comprising an ultraviolet absorbing abrasion resistant coating over a metal layer. Also provided are ultraviolet absorbing abrasion resistant coatings and methods for optimizing the ultraviolet absorption of an abrasion resistant coating. Reflective films disclosed herein are useful for solar reflecting, solar collecting, and solar concentrating applications, such as for the generation of electrical power.

CROSS REFERENCE TO RELATED APPLICATION

This application is a continuation of U.S. patent application Ser. No.13/790,099 filed Mar. 8, 2013, which is incorporated herein by referencein its entirety.

STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT

This invention was made with governmental support under awardsDE-EE0003584.000 and DE-SC0009224TDD awarded by the Department ofEnergy. The government has certain rights in the invention.

BACKGROUND

This invention is in the field of reflective films. This inventionrelates generally to an improved solar reflector for reflecting amajority of incident solar radiation, for example, for applications ofconcentrating solar power.

The overall reflectivity of solar reflectors is primarily dependent uponthe reflection efficiency of the active reflective materials in thesolar reflector as a function of the wavelength of incident solarelectromagnetic radiation. Early thin-film reflectors incorporated thinaluminum films as the active reflector. For example, U.S. Pat. No.4,307,150 for Weatherable Solar Reflector, issued on Dec. 21, 1981,discloses a solar reflector comprising an aluminum surface depositedover a flexible polyester support sheet. Later, silver thin-filmreflectors were utilized, since silver is higher in reflectance thanaluminum for most wavelengths of the solar spectrum. U.S. Pat. No.4,645,714 for Corrosion-resistant Silver Mirror, issued on Feb. 24,1987, discloses a specular reflective mirror film comprising a silversurface deposited over a polyester support film.

More recently, advanced optical materials and structures wereincorporated into solar reflectors. For example, U.S. Patent ApplicationPublication US 2012/0011850 for Broadband Reflectors, Concentrated SolarPower Systems, and Methods of Using the Same, published on Jan. 19,2012, discloses a broadband UV-reflective multilayer optical filmincluding alternating layers of higher and lower refractive indexmaterials in a quarter-wave stack configuration, optimized forreflecting incident UV radiation.

SUMMARY

The simplicity, efficiency and weatherability of prior solar reflectivefilms are improved upon by the present invention. For example, disclosedare reflective thin film constructions including a reduced number oflayers, which provides for increased solar-weighted hemisphericalreflectance and durability. Reflective films of the present inventioninclude those comprising an ultraviolet absorbing abrasion resistantcoating provided over a metal layer, and optionally over a polymericlayer. Also disclosed are ultraviolet absorbing abrasion resistantcoatings and methods for optimizing the ultraviolet absorption of anabrasion resistant coating. Reflective films disclosed herein are usefulfor solar reflecting, solar collecting, and solar concentratingapplications, such as for the generation of electrical power. In anembodiment, the reflective films of the invention provide an enhancementin the reflectance of incident terrestrial solar radiation equal to 1%or greater than currently available by state-of-the-art solar polymerfilm reflectors.

In one aspect, provided are multilayer reflective films. A reflectivefilm of this aspect comprises an adhesive layer; a metal layer providedabove, and optionally in physical contact with, the adhesive layer; apolymeric layer provided above, and optionally in physical contact with,the metal layer; and an abrasion resistant layer provided above, andoptionally in physical contact with, the polymeric layer. Anotherreflective film of this aspect comprises a polymeric layer; a metallayer provided above, and optionally in physical contact with, thepolymeric layer; an abrasion resistant layer provided above, andoptionally in physical contact with, the metal layer and, optionally, anadhesive layer provided beneath, and optionally in physical contact withthe polymeric layer. Optionally, the abrasion resistant layer is acoating. Optionally, the abrasion resistant layer is a hard-coat layer.

In an embodiment, the abrasion resistant layer is an exterior layer withrespect to the path of incident solar electromagnetic radiation. In anembodiment, the polymeric layer is an interior layer with respect to thepath of incident solar electromagnetic radiation positioned, directly orindirectly, between the abrasion resistant layer and the metalreflective layer. In an embodiment, the metal layer is an interior layerwith respect to the path of incident solar electromagnetic radiationpositioned, directly or indirectly, between the abrasion resistant layerand the polymer layer.

For some embodiments, positioning the abrasion resistant layer at theexterior of a multilayer reflective film serves to protect underlyinglayers from, for example, excessive exposure to damaging ultravioletelectromagnetic radiation or from exposure to abrasive conditions whichcould damage or otherwise degrade the functionality of the underlyinglayers. Optionally, the abrasion resistant layer has a cut-offwavelength in the ultraviolet region or near ultraviolet regions of theelectromagnetic spectrum. For example, the abrasion resistant layer hasa cut-off wavelength for some applications less than 385 nm, or in someembodiments less than 382 nm or less than 380 nm. Optionally, theabrasion resistant layer has a cut-off wavelength less than 375 nm, lessthan 370 nm, less than 365 nm, less than 360 nm, less than 355 nm orless than 350 nm or selected from the range of 355 to 385 nm or selectedfrom the range of 350 nm to 365 nm.

In embodiments, providing an abrasion resistant layer with a cut-offwavelength less than 385 nm, for example, allows the abrasion resistantlayer to serve as a screening layer to reduce or otherwise preventexposure underlying layers to excessive electromagnetic radiation withwavelengths less than the cut-off wavelength. In embodiments, use ofabrasion resistant layers having these properties allows, for example,the reflection and collection of terrestrial solar electromagneticradiation having wavelengths less than 385 nm—electromagnetic radiationthat would otherwise be absorbed by an abrasion resistant or ultravioletscreening layer with a cut-off wavelength greater than those of theabrasion resistant layers described herein. Optionally, a reflectivefilm of this aspect has a reflectivity spectrum for incident solarelectromagnetic radiation that includes a contribution fromelectromagnetic radiation having wavelengths between 385 nm and thecut-off wavelength.

In embodiments, the abrasion resistant layer absorbs a majority ofincident ultraviolet electromagnetic radiation having a wavelength lessthan the cut-off wavelength, for example a majority of incidentterrestrial solar ultraviolet radiation having a wavelength less thanthe cut-off wavelength. In embodiments, the abrasion resistant layer hasan absorptance of greater than or equal to 50% for electromagneticradiation (e.g. ultraviolet electromagnetic radiation) having awavelength less than the cut-off wavelength, for example incidentterrestrial solar radiation having a wavelength less than the cut-offwavelength. For some applications, the absorptance of the abrasionresistant layer increases to greater than or equal to 90% forelectromagnetic radiation having a wavelength less than 5 to 10 nm belowthe cut-off wavelength. Optionally, the abrasion resistant layerprotects underlying metal layers, polymeric layers and/or adhesivelayers by reducing or eliminating their exposure to electromagneticradiation having wavelengths less than the cut-off wavelength. Inembodiments, the abrasion resistant layer transmits a majority ofincident electromagnetic radiation having a wavelength greater than thecut-off wavelength, for example, a majority of electromagneticradiation, such as incident terrestrial solar electromagnetic radiation,having a wavelength between the cut-off wavelength and 2.5 μm. Inembodiments, the abrasion resistant layer has a transmittance of greaterthan or equal to 50% for electromagnetic radiation having a wavelengthgreater than the cut-off wavelength or selected between the cut-offwavelength and 2.5 μm, or a transmittance of greater than or equal to50% for incident terrestrial solar electromagnetic radiation having awavelength greater than the cut-off wavelength.

A wide range of materials are useful in abrasion resistant layers of thereflective films of the invention. In some embodiments, for example, theabrasion resistant layer comprises a polymer, an acrylate, an acrylic, apolyolefin, a cyclic olefin polymer, a cyclic olefin copolymer, athermoplastic, nano-particle coatings, sol gel coatings or anycombination of these. Useful abrasion resistant layers include, but arenot limited to, those comprising a UV cured acrylate,poly(methylmethacrylate) (PMMA), ethylene-norbornene copolymer,polynorbornene, Zeonex®, Zeonor®, CR-39, copolymerized styrene andmethyl methacrylate, NAS®, ZYLAR® and any combination of these.

Useful abrasion resistant layers include those optionally comprising oneor more ultraviolet absorbing compounds, for example distributed in asupporting medium such as a polymer-containing layer. Exemplaryultraviolet absorbing compounds include, but are not limited to,oxanilide, benzophenone, HP triazine, benzotriazole, formamidine and anyderivatives of these. Specific ultraviolet absorbing compounds usefulwith the abrasion resistant layers described herein include, but are notlimited to: 2,4-Dihydroxybenzophenone,2-hydroxy-4-(octyloxy)benzophenone, 2-Hydroxy-4-methoxybenzophenone,α-[3-[3-(2H-benzotriazol-2-yl)-5-(1,1-dimethylethyl)-4-hydroxyphenyl]-1-oxopropyl]-ω-hydroxypoly(oxo-1,2-ethanediyl),α-[3-[3-(2H-benzotriazol-2-yl)-5-(1,1-dimethylethyl)-4-hydroxyphenyl]-1-oxopropyl]-ω-[3-[3-(2H-benzotriazol-2-yl)-5-(1,1-dimethylethyl)-4-hydroxyphenyl]-1-oxopropyl]-poly(oxy-1,2-ethanediyl),2-(3,5-Di-tert-butyl-2-hydroxyphenyl)-2H-benzotriazole,2-(3-tert-Butyl-2-hydroxy-5-methylphenyl)-5-chloro-2H-benzotriazole,2-(2′-Hydroxy-3′,5′-di-tert-butylphenyl)-5-chlorobenzotriazole,2-(2-Hydroxy-3,5-dipenryl-phenyl)benzotriazole,2-(2H-Benzotriazol-2-yl)-4-(1,1,3,3-tetramethylbutyl)phenol,2-(2-Hydroxy-5-methylphenyl)benzotriazole andN-(Ethoxycarbonylphenyl)-N′-Methyl-N′-Phenylformamidine and anyderivatives, combinations or variants of these. Optionally, the abrasionresistant layer comprises combinations of two or more ultravioletabsorbing compounds.

In some embodiments, for example, the abrasion resistant layer comprisesa combination of ultraviolet absorbing compounds selected to provideoverall optical properties of the reflective film beneficial for aspecific application, such as concentrating solar power. In embodiments,a combination of two or more ultraviolet absorbing compounds is usefulfor adjusting the exact drop-off shape of the absorptance profile of theabrasion resistant layers. In embodiments, concentrations and cut-offwavelengths for various ultraviolet absorbing compounds areindependently selected so as to provide a specific absorptance profilebelow the cut-off wavelength of the abrasion resistant coating.Optionally, at least one of the one or more ultraviolet absorbingcompounds has a cut-off wavelength less than 385 nm, 375 nm, 370 nm, 365nm, 360 nm, 355 nm or 350 nm or selected from the range of 355 to 385 nmor selected from the range of 350 nm to 365 nm.

The absorption of electromagnetic radiation by the abrasion resistantlayer is generally governed by Beer's Law for some applications. Factorsthat impact the absorption of electromagnetic radiation include thethickness of the abrasion resistant layer and the concentration ofultraviolet absorbers, such as ultraviolet absorbing compounds,comprising the abrasion resistant layer. Optionally, the abrasionresistant layer has a thickness selected from the range of 1 μm to 5 μm.Optionally, the abrasion resistant layer has a thickness selected fromthe range of 1 μm to 10 μm. Optionally, the abrasion resistant layer hasa thickness selected from the range of 2 μm to 10 μm. Optionally, theabrasion resistant layer has a thickness selected from the range of 5 μmto 10 μm. Optionally, the abrasion resistant layer has a thicknessselected from the range of 10 μm to 15 μm. Optionally, the abrasionresistant layer has a thickness selected from the range of 15 μm to 20μm. Optionally, the concentration of one or more ultraviolet absorbingcompounds comprising the absorption resistant layer is selected from therange of 0.1% to 5% by weight. Optionally, the concentration of one ormore ultraviolet absorbing compounds comprising the absorption resistantlayer is selected from the range of 0.5% to 5% by weight. Optionally,the concentration of one or more ultraviolet absorbing compoundscomprising the absorption resistant layer is selected from the range of0.1% to 2% by weight. Optionally, the concentration of one or moreultraviolet absorbing compounds comprising the absorption resistantlayer is selected from the range of 1% to 5% by weight. Optionally, theconcentration of one or more ultraviolet absorbing compounds comprisingthe absorption resistant layer is selected from the range of 2% to 5% byweight. In an embodiment, the concentrations of one or more ultravioletabsorbing compounds comprising the abrasion resistant layer are selectedso as to provide a cut-off wavelength to the abrasion resistant layer,such as a cut-off wavelength less than 385 nm or less than 380 nm.Optionally, one or more ultraviolet absorbing compounds are uniformlydistributed in the abrasion resistant layer, for example, having aconcentration throughout the layer within a factor of 0.8 to 1.2 of theaverage concentration. Optionally, one or more ultraviolet absorbingcompounds are non-uniformly distributed in the abrasion resistant layer,for example, having a spatial distribution for a specific application(e.g., a functionally graded coating having enhanced concentration atthe surface).

In embodiments, abrasion resistant layers may have a tendency toseparate from a directly underlying layer, for example, if covalent ornon-covalent forces between the abrasion resistant layer and directlyunderlying layer are insufficient to maintain full adhesion and bondingbetween the layers. Thus, a multilayer reflective film of this aspectoptionally further comprises an adhesion-promoting layer provided below,and optionally in physical contact with, the abrasion resistant layer.In embodiments, the adhesion-promoting layer comprises an interlayer,for example a separate layer between an abrasion resistant layer and anunderlying polymeric layer or metal layer. In embodiments, theadhesion-promoting layer comprises a region of a polymeric layer ormetal layer that has undergone surface treatment, such as a plasmatreatment or a corona discharge treatment. Adhesion-promoting layers ofthis aspect serve to enhance the covalent or non-covalent bondingbetween the materials of the abrasion resistant layer and the materialsof the adhesion-promoting layer or underlying layers. For example,surface treatment of a polymeric layer or metal layer optionallyincreases covalent bonding established between the abrasion resistantlayer and the polymeric layer or metal layer when the abrasion resistantlayer is applied to the polymeric layer or metal layer. In someembodiments, a surface treatment results in an increase in surface areawhen compared to the surface area before the surface treatment. Such anincrease in surface area can optionally result in stronger adhesion ofan abrasion resistant layer to a treated surface when compared with anon-treated surface.

Metal layers useful with the multilayer reflective films of this aspectinclude those comprising silver or an alloy thereof. Optionally, areflective film further comprises a second metal protective layer, suchas copper, chromium, nickel or alloys thereof in combination with ametal layer comprising a silver layer or alloy thereof. In use inmultilayer reflective films, the metal layer is optionally exposed toincident solar radiation having wavelengths selected from the range of350 nm to 385 nm as well as incident solar radiation having wavelengthswithin the range of 385 nm and 2.5 μm. Optionally, a reflective filmfurther comprises a single or multilayer dielectric stack above themetal layer. Dielectric stack layers are optionally useful to enhancethe reflectivity of the multilayer reflective films for at least aregion of the electromagnetic spectrum.

In certain circumstances, a metal layer, such as a silver layer or analloy thereof, transmits some electromagnetic radiation, for example asmall amount, such as less than 1% or less than 0.1% of incidentelectromagnetic radiation, thus exposing underlying layers, such asadhesive layers or polymeric layers, to the transmitted electromagneticradiation. For some embodiments where the multilayer films of theinvention are used for solar collection or solar reflectionapplications, even this small amount of transmission can degrade theunderlying layers. Particularly, as the multilayer films of someembodiments are exposed to incident solar electromagnetic radiation overlong time scales, this long exposure to small amounts of electromagneticradiation including ultraviolet electromagnetic radiation can damageunderlying layers. Thus, a multilayer reflective film of this aspectoptionally further comprises a backside metal protective layer providedbelow, and optionally in physical contact with, the metal layer. Usefulbackside metal protective layers include, but are not limited to thosecomprising copper, chromium, nickel or any alloy of these. Use ofbackside metal protective layers, in embodiments, serves to enhance thereflectivity of an overlying metal layer. Use of backside metalprotective layers, in embodiments, provides an additional absorbinglayer beneath the metal layer, useful for screening underlying layersfrom radiation transmitted through the overlying metal layer. Inembodiments, backside metal protective layers provide an enhancedprotection to underlying layers, such as a polymeric layer or anadhesive layer, from excessive exposure to damaging electromagneticradiation, such as ultraviolet electromagnetic radiation. Optionally,the metal layer itself further comprises a backside metal protectivelayer, such as copper, chromium, nickel or alloys thereof. Optionally,the metal layer comprises a multilayer including a backside metalprotective layer and a silver layer. In certain embodiments, the metallayer comprises a backside metal protective layer above the adhesivelayer and a silver layer above the backside metal protective layer. Inother embodiments, the metal layer comprises a backside metal protectivelayer above the polymeric layer and a silver layer above the backsidemetal protective layer.

In an embodiment, the purity of the metal layer, such as a silver and/orbackside metal protective layer, is greater than or equal to 99.999%.Optionally, the purity of a metal layer and/or a backside metalprotective layer, is less than or equal to 99.999%. Useful metal layersinclude, but are not limited to, those formed by thin film depositionmethods, such as physical vapor deposition, chemical vapor depositionand/or sputtering. Exemplary metal layers have a thickness selected fromthe range of 0.01 μm to 0.15 μm. In some embodiments, for example, ametal has an overall thickness selected from the range of 0.05 μm to0.15 μm. In some embodiments, a metal layer including multiple metallayers has an overall thickness selected from the range of 0.05 μm to0.25 μm.

A wide range of polymers are useful in polymer layers of the reflectivefilms of the invention. Polymeric layers useful with the multilayerreflective films of this aspect include, but are not limited to, thosecomprising a polyester, for example polyethylene terephthalate (PET).Exemplary polymeric layers have a thickness selected from the range of10 μm to 130 μm.

A wide range of adhesives are useful in adhesive layers of thereflective films of the invention. Adhesive layers useful with themultilayer reflective films of this aspect include, but are not limitedto, those comprising a pressure sensitive adhesive. Optionally, films ofthis aspect further comprise a release liner. Optionally, the releaseliner is positioned beneath the adhesive layer. Optionally, the releaseliner is positioned in physical contact with the adhesive layer.Exemplary adhesive layers include those having a thickness selected fromthe range of 10 μm to 60 μm.

Reflective films of this aspect include those which are highlyreflective within the terrestrial solar spectrum, such as within thewavelength range of 300 nm to 2.5 μm or within the wavelength rangebetween a cut-off wavelength of an abrasion resistant layer and 2.5 μm.Optionally, the reflective film is more than 85% reflective, optionallymore than 90% reflective, and optionally more than 95% reflective withinthe wavelength range between a cut-off wavelength of the abrasionresistant layer and 2.5 μm.

Optionally, reflective films of this aspect do not comprise an acryliclayer. For example, in one embodiment, a reflective film does notinclude an acrylic layer between the polymeric layer and the abrasionresistant layer. Optionally, the adhesive layer and the metal layer arein physical contact. Optionally, the metal layer and the polymeric layerare in physical contact. Optionally, the abrasion resistant layer andthe polymeric layer are in physical contact. Optionally, the abrasionresistant layer and the metal layer are in physical contact.

In one embodiment, the reflective film consists of or consistsessentially of the metal layer, the polymeric layer and the abrasionresistant layer. In one embodiment, the reflective film consists of orconsists essentially of the metal layer, the polymeric layer, theabrasion resistant layer and the adhesive layer. In one embodiment, thereflective film consists of or consists essentially of the metal layer,the polymeric layer, the abrasion resistant layer, the adhesive layerand the release liner.

Useful reflective films of this aspect include, but are not limited to,reflective films having a total thickness selected from the range of 10μm to 130 μm. In embodiments, the reflective film has a solar-weightedhemispherical reflectance that includes a contribution from reflectionof electromagnetic radiation having wavelengths less than 385 nm.

The reflective films described herein are useful for a variety ofapplications. For example, a reflective film is useful for a solarcollecting application, for use in concentrating solar energy and foruse in generating electricity. The invention includes, concentratingsolar energy system or solar collecting system for power generationcomprising any of the disclosed reflective films. In an embodiment, forexample, a concentrating solar power or collection system of theinvention comprises any of the disclosed reflective films provided in alarge area form factor. In an embodiment, for example, a concentratingsolar power or collection system of the invention comprises any of thedisclosed reflective films provided in a curved form factor to providecollection and focusing of incident solar energy onto a heat exchangefluid, such as a heat exchange fluid housed in a central fluidcontainment vessel. In another aspect, provided are methods ofcollecting solar radiation. A method of this aspect comprises the stepsof positioning a multilayer reflective film to receive incident solarradiation, providing a target in optical communication with thereflective film and reflecting at least a portion of the incident solarradiation to the target.

In another aspect, provided are methods of making a multilayerreflective film. A first method of this aspect comprises the steps ofproviding a polymer film, providing a metal layer onto a first side ofthe polymer film, providing an adhesive layer onto the metal layer andproviding an abrasion resistant layer onto a second side of the polymerfilm. A second method of this aspect comprises the steps of providing apolymer film, providing a metal layer onto a first side of the polymerfilm and providing an abrasion resistant layer onto the metal layer.Optionally, an adhesive layer is provided onto a second side of thepolymer film. Useful abrasion resistant layers, metal layers andadhesive layers include those described above. Useful polymer filmsinclude polymeric layers described above. Optionally, a multilayerreflective film is constructed using a roll-to-roll processing method.

In another aspect, provided are abrasion resistant coatings. Anembodiment of this aspect comprises an acrylic and one or moreultraviolet absorbing compounds. Optionally, at least one of theultraviolet absorbing compounds has a cut-off wavelength less than 385nm or selected from the range of 345 to 385 nm. Useful ultravioletabsorbing compounds include, but are not limited to, oxanilide,benzophenone, HP triazine, benzotriazole, formamidine and anyderivatives of these. Useful specific ultraviolet absorbing compoundsinclude, but are not limited to, 2,4-Dihydroxybenzophenone,2-hydroxy-4-(octyloxy)benzophenone, 2-Hydroxy-4-methoxybenzophenone,α-[3-[3-(2H-benzotriazol-2-yl)-5-(1,1-dimethylethyl)-4-hydroxyphenyl]-1-oxopropyl]-ω-hydroxypoly(oxo-1,2-ethanediyl),α-[3-[3-(2H-benzotriazol-2-yl)-5-(1,1-dimethylethyl)-4-hydroxyphenyl]-1-oxopropyl]-ω-[3-[3-(2H-benzotriazol-2-yl)-5-(1,1-dimethylethyl)-4-hydroxyphenyl]-1-oxopropyl]-poly(oxy-1,2-ethanediyl),2-(3,5-Di-tert-butyl-2-hydroxyphenyl)-2H-benzotriazole,2-(3-tert-Butyl-2-hydroxy-5-methylphenyl)-5-chloro-2H-benzotriazole,2-(2′-Hydroxy-3′,5′-di-tert-butylphenyl)-5-chlorobenzotriazole,2-(2-Hydroxy-3,5-dipenryl-phenyl)benzotriazole,2-(2H-Benzotriazol-2-yl)-4-(1,1,3,3-tetramethylbutyl)phenol,2-(2-Hydroxy-5-methylphenyl)benzotriazole andN-(Ethoxycarbonylphenyl)-N′-Methyl-N′-Phenylformamidine.

In embodiments, a method of making an abrasion resistant coating of thisaspect comprises the steps of identifying a cut-off wavelength for theabrasion resistant coating, such as a cut-off wavelength less than 385nm or selected from the range of 345 to 385 nm; selecting a firstultraviolet absorbing compound having the cut-off wavelength; andproviding the first ultraviolet absorbing compound into an acrylicmixture. Optionally, a method of making an abrasion resistant coatingfurther comprises a step of selecting a concentration of the ultravioletabsorbing compound in the acrylic mixture, such that the step ofproviding the ultraviolet absorbing compound into an acrylic mixturecomprises providing the ultraviolet absorbing compound in to the acrylicmixture at the selected concentration. Optionally, the abrasionresistant coating comprises one or more additional ultraviolet absorbingcompounds. In an embodiment, a method of making an abrasion resistantcoating further comprises a step of selecting concentrations of the oneor more additional ultraviolet absorbing compounds, where the step ofproviding the one or more additional ultraviolet absorbing compoundscomprises providing the one or more additional ultraviolet absorbingcompounds into the acrylic mixture at the selected concentrations.

Without wishing to be bound by any particular theory, there can bediscussion herein of beliefs or understandings of underlying principlesrelating to the invention. It is recognized that regardless of theultimate correctness of any mechanistic explanation or hypothesis, anembodiment of the invention can nonetheless be operative and useful.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 depicts a multilayer reflective film embodiment.

FIG. 2 depicts a roll-to-roll processing method for making a reflectivefilm.

FIGS. 3A-3C depict multilayer reflective film embodiments.

FIG. 4 depicts a multilayer reflective film embodiment.

FIGS. 5A-5C depict multilayer reflective film embodiments.

FIG. 6 depicts a multilayer reflective film embodiment.

FIGS. 7A-7C depict multilayer reflective film embodiments.

FIG. 8 provides data showing hemispherical absorptance obtained by tworeflective film embodiments.

FIG. 9 provides data showing spectral hemispherical transmittance of anabrasion resistant layer coated onto a quartz plate substrate.

FIG. 10 illustrates bond strengths and wavelengths required for breakingvarious organic bonds.

FIG. 11 provides data showing the spectral transmittance properties ofvarious ultraviolet absorber packages.

FIGS. 12, a and b provide data showing transmittance of variousultraviolet absorber packages at two different concentrations/loadings.

FIG. 13 illustrates the percentage of solar spectrum regainable and thepercentage increase in solar-weighted hemispherical reflectance as afunction of cut-off wavelength of an ultraviolet absorbing abrasionresistant layer.

FIG. 14 provides an overlay plot showing: (i) the solar irradiance(W/m²/nm) as a function of wavelength and (ii) spectral hemisphericalreflectance (%) as a function of wavelength for a conventionalreflective film incorporating a broadband ultraviolet absorber (UVA)package to provide UV resistance to the reflective film.

DETAILED DESCRIPTION

In general the terms and phrases used herein have their art-recognizedmeaning, which can be found by reference to standard texts, journalreferences and contexts known to those skilled in the art. The followingdefinitions are provided to clarify their specific use in the context ofthe invention.

“Cut-off wavelength” refers to a wavelength of electromagnetic radiationat which a composition or structure, such as the screening layers of areflective film, layer or coating, exhibits a transmittance value of 50%of the maximum transmittance for a first spectral region includingwavelengths greater than the cut-off wavelength, and for whichtransmittance values for a second spectral region including wavelengthsless than the cut-off wavelength are less than 50% of the maximumtransmittance of the spectral region. In embodiments, cut-off wavelengthrefers to the wavelength at which an abrasion resistant layer has atransmittance value that is 50% of the maximum transmittance of theabrasion resistant layer over the terrestrial solar spectrum or portionthereof, such as the visible region of the terrestrial solar spectrum,and wherein the abrasion resistant layer exhibits a transmittance lessthan 50% for wavelengths of light of the terrestrial solar spectrum, orportion thereof, less than the cutoff wavelength, for example, byexhibiting a transmittance less than 50% for wavelength of light belowthe cut-off wavelength in the ultraviolet region of the terrestrialsolar spectrum. Some abrasion resistant layers, for example, exhibit achange in transmittance characterized by high transmittance values(e.g., greater than 80% or greater than 90%) in the visible region ofthe terrestrial solar spectrum and a rapid fall-off in transmittance inthe near ultraviolet region, for example exhibiting a change intransmittance approximating a step function, wherein the cut-offwavelength corresponds to a point on the fall-off for which thetransmittance is 50% of the maximum value in the visible region of theterrestrial solar spectrum. For some abrasion resistant layers, forexample, the transmittance values for wavelengths of the terrestrialsolar spectrum 5 nanometers, or optionally 10 nanometers, below thecut-off wavelength are significantly less than 50%, for example lessthan 10%, and optionally less than 1% and optionally for someembodiments less than 0.1%. For some abrasion resistant layers, forexample, the transmittance values for wavelengths of the terrestrialsolar spectrum 5 nanometers, or optionally 10 nanometers, above thecut-off wavelength are significantly greater than 50%, for examplegreater than 80%, optionally greater than 90%, and optionally greaterthan 95%.

In certain embodiments, a cut-off wavelength refers to an ultravioletwavelength of the terrestrial solar spectrum at which the transmittanceof a composition or a structure, such as the abrasion resistant layer ofa reflective film, layer or coating, is equal to 50% of the maximumtransmittance value for the composition or structure in the visibleregion of the terrestrial solar spectrum. FIG. 9 illustrates anexemplary embodiment identifying the cut-off wavelength (λ_(CutOff)) ofan abrasion resistant layer as having a transmittance value equal to ½of the maximum transmittance value (τ_(max)) of the abrasion resistantlayer in the visible region of the spectrum.

In embodiments, 50% or more of incident radiation having wavelengthsabove the cut-off wavelength are transmitted through a composition or astructure, such as a film, layer or coating, having the cut-offwavelength. For example, for some embodiments of the present inventionan abrasion resistant layer has a transmittance of greater than or equalto 60%, greater than or equal to 70%, greater than or equal to 80%,greater than or equal to 90% or greater than or equal to 95% forelectromagnetic radiation having a wavelength greater than the cut-offwavelength or selected between the cut-off wavelength and 2.5 μm.

“Ultraviolet absorbing compound” refers to a composition which absorbsultraviolet electromagnetic radiation. In embodiments, ultravioletabsorbing compounds are added to mixtures, films or opticallytransparent materials to provide absorptance (and thereby prevent orreduce the transmittance) of at least a portion of ultravioletelectromagnetic radiation through the mixtures, films or opticallytransparent materials. Useful ultraviolet absorbing compounds includethose exhibiting a cut-off wavelength selected from the range of 345 nmto 385 nm.

“Abrasion resistant” refers to a property of a layer, coating ormaterial to withstand damage sustained through friction or wear, such asdamaged sustained by scratching or scuffing. In embodiments, usefulabrasion resistant materials include acrylics, acrylic mixtures,polyolefins, cyclic olefin polymers, cyclic olefin copolymers,thermoplastics, polyesters, PETs. Abrasion resistance can be assessedusing standardized methods, such as ASTM Standard D4060 or variationsthereof. In the context of reflective films having an abrasion resistantcoating, useful abrasion resistant coatings include, but are not limitedto, those abrasion coatings, which when damaged through friction orwear, that do not impact or have a minimal impact on a specularreflectance of the reflective film, such as a change in specularreflectance less than 2%.

“Absorptance” refers to a property of an object or material that absorbslight. In general, the term absorptance refers to the percentage oflight absorbed by the object or material. In embodiments, the termabsorptance refers to the percentage of light absorbed by the object ormaterial at a specified wavelength or within a specified wavelengthrange.

In embodiments, the present invention provides reflective films in whichan abrasion resistant layer has an absorptance of greater than or equalto 80%, greater than or equal to 90% or greater than or equal to 95% forat least a portion of electromagnetic radiation having a wavelength lessthan the abrasion resistant layer's cut-off wavelength. Optionally, anabsorptance profile of an abrasion resistant layer is selected such thatthe absorptance of the abrasion resistant layer is greater than 90% forelectromagnetic radiation, for example terrestrial solar electromagneticradiation, having wavelengths less than 5 or 10 nm below the abrasionresistant layer's cut-off wavelength. Such an absorptance profile can beselected, for example, by adjusting a concentration of one or moreultraviolet absorbing compounds present in the abrasion resistant layer.

“Reflectance” and “percent reflective” refer to a property of an object,material, layer, film or surface. In general, the term reflectancerefers to the percentage of light reflected by the object or material.In embodiments, the term reflectance refers to the percentage of lightreflected by the object or material at a specified wavelength or withina specified wavelength range.

For example, for certain embodiments of the present invention areflective film is more than 90% reflective within the wavelength rangebetween a cut-off wavelength of an abrasion resistant layer and 2.5 μm,such as within the range of 285 nm to 2.5 μm. Optionally, a reflectivefilm is more than 95% reflective within the wavelength range between acut-off wavelength of an abrasion resistant layer and 2.5 μm.

“Solar-weighted hemispherical reflectance” refers to a standardizedmeasure characterizing the quality and performance of solar reflectors.In certain embodiments, specific wavelength regions contribute to andcomprise a portion of the solar-weighted hemispherical reflectance of asolar reflector. In certain cases, specific wavelength regions do notcontribute to the solar-weighted hemispherical reflectance of a solarreflector, for example if the electromagnetic radiation in the specificwavelength region is absorbed by the solar reflector.

“Solar radiation” refers to electromagnetic radiation from the sun.“Terrestrial solar radiation” refers to solar radiation that istransmitted through the atmosphere of the Earth. “Incident solarradiation” refers to solar radiation received by a film, mirror ordevice.

“Polymer” refers to a macromolecule composed of repeating structuralunits connected by covalent chemical bonds or the polymerization productof one or more monomers, often characterized by a high molecular weight.The term polymer includes homopolymers, or polymers consistingessentially of a single repeating monomer subunit. The term polymer alsoincludes copolymers, or polymers consisting essentially of two or moremonomer subunits, such as random, block, alternating, segmented, graft,tapered and other copolymers. Useful polymers include organic polymers,inorganic polymer and/or hybrid polymers and may be in amorphous,semi-amorphous, crystalline or partially crystalline states. Crosslinked polymers having linked monomer chains are particularly useful forsome applications, such as for abrasion resistant coating (ARCs).Polymers useful in the present methods, devices and device componentsinclude, but are not limited to, plastics, thermoplastics and acrylates.Exemplary polymers include, but are not limited to, acetal polymers,cellulosic polymers, fluoropolymers, nylons, polyacrylonitrile polymers,polyamide-imide polymers, polyimides, polyarylates, polybenzimidazole,polybutylene, polycarbonate, polyesters, polyetherimide, polyethylene,polyethylene copolymers and modified polyethylenes, polyketones,poly(methyl methacrylate, polymethylpentene, polyphenylene oxides andpolyphenylene sulfides, polyphthalamide, polypropylene, polyurethanes,styrenic resins, sulfone based resins, vinyl-based resins, rubber(including natural rubber, styrene-butadiene, polybutadiene, neoprene,ethylene-propylene, butyl, nitrile, silicones), acrylic, nylon,polycarbonate, polyester, polyethylene, polypropylene, polystyrene,polyvinyl chloride, polyolefin, polyolefins, cyclic olefin polymers,cyclic olefin copolymers, thermoplastics, polyesters, PETs or anycombinations of these. A “polymeric layer” refers to a layer of areflective film comprising a polymer or consisting essentially of apolymer. Useful polymeric layers include, but are not limited to,polymer films and polymer coatings.

“Optical communication” refers to a relative positioning of two objectssuch that electromagnetic radiation can be directed directly between theobjects or indirectly between the objects, such as through one or moreintervening optical elements, for example a lens, a reflector, a filter,a grating, etc.

“Roll-to-roll processing method” refers to a method for formingmultilayer films where a roll of film is processed by unwinding the filmfrom a first roll, applying coating layers, joining with additionalrolls of film or otherwise processing the film and winding the processedmultilayer film onto a second roll.

FIG. 1 shows a cross section of an exemplary multilayer reflective film100. In this embodiment, the lowest layer 101 comprises an adhesive, thelayer immediately above the adhesive layer 101 comprises a metal layer102, the layer immediately above the metal layer 102 comprises apolymeric layer 103 and the topmost layer comprises an abrasionresistant layer 104. Optionally, a release liner is applied beneath theadhesive, for example to facilitate winding multilayer reflective film100 onto a roll. In an embodiment, for example, adhesive layer 101 is inphysical contact, and optionally directly bonded to (e.g., via covalentbonding, intermolecular forces, Van Der Waals forces, etc.) to metallayer 102. In an embodiment, for example, metal layer 102 is in physicalcontact, and optionally directly bonded to (e.g., via covalent bonding,intermolecular forces, Van Der Waals forces, etc.) to polymeric layer103. In an embodiment, for example, polymeric layer 103 is in physicalcontact, and optionally directly bonded to (e.g., via covalent bonding,intermolecular forces, Van Der Waals forces, etc.) to abrasion resistantlayer 104.

FIG. 2 illustrates a roll-to-roll processing method for making film 100.Initially, a roll 203 of polymer film is provided. As the polymer filmis unrolled from roll 203, a metal layer is deposited 202 onto one sideof the polymer film during the processing method. An abrasion resistantlayer is then applied to the other side of the of the polymer film byapplying 204A a layer of uncured abrasion resistant material, followedby UV curing 204B. Finally, an adhesive is applied 201 beneath the metallayer. To facilitate winding the assembled film onto a second roll 205,a release liner from roll 206 is applied beneath the adhesive.Alternative routes for making the films include, but are not limited to,vacuum deposition processes such as sputtering and thermal evaporationand physical and chemical vapor deposition.

FIG. 3A shows a cross section of an exemplary multilayer reflective film300A. This film is similar to film 100 shown in FIG. 1, except film 300Afurther comprises a backside metal protective layer 305 below metallayer 302 and above adhesive layer 301. FIG. 3B shows a cross section ofan exemplary multilayer reflective film 300B. This film is similar tofilm 100 shown in FIG. 1, except film 300B further comprises anadhesion-promoting interlayer 306 below abrasion resistant layer 304 andabove polymeric layer 303. FIG. 3C shows a cross section of an exemplarymultilayer reflective film 300C. This film is similar to film 100 shownin FIG. 1, except film 300C further comprises both a backside metalprotective layer 305 and an adhesion-promoting interlayer 306.

FIG. 4 shows a cross section of another exemplary multilayer reflectivefilm 400. In this embodiment, the lowest layer comprises a metal layer402, the layer immediately above the metal layer 402 comprises apolymeric layer 403 and the topmost layer comprises an abrasionresistant layer 404. Optionally, an adhesive layer is applied beneaththe polymeric layer, as in film 100. Optionally, a release liner isapplied beneath the adhesive layer. In an embodiment, for example, metallayer 402 is in physical contact, and optionally directly bonded to(e.g., via covalent bonding, intermolecular forces, Van Der Waalsforces, etc.) to polymeric layer 403. In an embodiment, for example,polymeric layer 403 is in physical contact, and optionally directlybonded to (e.g., via covalent bonding, intermolecular forces, Van DerWaals forces, etc.) to abrasion resistant layer 404.

FIG. 5A shows a cross section of an exemplary multilayer reflective film500A. This film is similar to film 400 shown in FIG. 4, except film 500Afurther comprises a backside metal protective layer 505 below metallayer 502. FIG. 5B shows a cross section of an exemplary multilayerreflective film 500B. This film is similar to film 400 shown in FIG. 4,except film 500B further comprises an adhesion-promoting interlayer 506below abrasion resistant layer 504 and above polymeric layer 503. FIG.5C shows a cross section of an exemplary multilayer reflective film500C. This film is similar to film 400 shown in FIG. 4, except film 500Cfurther comprises both a backside metal protective layer 505 and anadhesion-promoting interlayer 506.

FIG. 6 shows a cross section of another exemplary multilayer reflectivefilm 600. In this embodiment, the lowest layer 603 comprises a polymericlayer, the layer immediately above the polymeric layer 603 comprises ametal layer 602 and the topmost layer comprises an abrasion resistantlayer 604. Optionally, an adhesive layer is applied beneath thepolymeric layer. Optionally, a release liner is applied beneath theadhesive layer. In an embodiment, for example, polymeric layer 603 is inphysical contact, and optionally directly bonded to (e.g., via covalentbonding, intermolecular forces, Van Der Waals forces, etc.) to metallayer 602. In an embodiment, for example, metal layer 602 is in physicalcontact, and optionally directly bonded to (e.g., via covalent bonding,intermolecular forces, Van Der Waals forces, etc.) to abrasion resistantlayer 604.

FIG. 7A shows a cross section of an exemplary multilayer reflective film700A. This film is similar to film 600 shown in FIG. 6, except film 700Afurther comprises a backside metal protective layer 705 below metallayer 702 and above polymeric layer 703. FIG. 7B shows a cross sectionof an exemplary multilayer reflective film 700B. This film is similar tofilm 600 shown in FIG. 6, except film 700B further comprises anadhesion-promoting interlayer 706 below abrasion resistant layer 704.FIG. 7C shows a cross section of an exemplary multilayer reflective film700C. This film is similar to film 600 shown in FIG. 6, except film 700Cfurther comprises both a backside metal protective layer 705 and anadhesion-promoting interlayer 706.

An example trajectory of incident solar electromagnetic radiation isschematically represented in FIGS. 1, 3A-3C, 4, 5A-5C, 6 and 7A-7C via adotted arrow, although it will be readily appreciated that a wide rangeof incident trajectories are useful with the present reflective filmsand methods. As shown by the example trajectory in these figures,incident solar electromagnetic radiation first interacts with theabrasion resistant layer prior to interaction with subsequent layers inthe stack. Accordingly, use of abrasion resistant layers having aselected cut-off wavelength in the disclosed geometries allows forprotection of the underlying layer (e.g., metal, polymer and/or adhesivelayers) by decreasing, or preventing, transmission of incidentelectromagnetic radiation capable of substantially degrading theunderlying layers. In addition, use of abrasion resistant layers havinga selected cut-off wavelength in the disclosed geometries allows forenhanced overall efficiency of reflection by enhancing transmission ofwavelengths that are effectively reflected by the underlying layersproviding reflection (e.g., the metal layer) without substantiallydegrading the underlying layers. Therefore, selection of the cut offwavelength of the abrasion resistant layer in the present inventionprovides significant benefits for solar concentrating power applications

The invention may be further understood by the following non-limitingexamples.

Example 1: Increasing Solar-Weighted Reflectance of Polymer FilmReflectors by Modifying the Screening Profile of UV Absorbing Additives

Central to the mirror film concept is the incorporation of ultraviolet(UV) screening layers to protect underlayers from photodegradation. Thisresults in blocking a significant part (over 2.5% of the availableterrestrial resource) of the solar spectrum that could otherwise bereflected and thereby increase the solar-weighted reflectance value.Realistic modification of the UV screening functionality can achieve animprovement in reflectance by ˜1 to 1.5%. The challenge in such“unscreening” of part of the UV spectrum is to assure that wavebandsneeded to provide adequate protection of chemical bonds present in thevarious layers of the reflector construction are not removed so thatrequisite weatherability of the overall reflector is maintained.

To illustrate this aspect of the invention, FIG. 14 provides an overlayplot showing: (i) the solar irradiance (W/m²/nm) as a function ofwavelength and (ii) spectral hemispherical reflectance (%) as a functionof wavelength for a conventional reflective film incorporating abroadband ultraviolet absorber (UVA) package to provide UV resistance tothe reflective film. As shown in FIG. 14, a significant amount of therecoverable solar irradiance is not reflected due to the presence of thebroadband ultraviolet absorber (UVA) package of conventional reflectivefilms of the art, thereby, decreasing the overall efficiency of suchfilms for concentrating solar power applications. The present invention,therefore, provides reflective films that enhance the recoverable solarirradiance while at the same time maintaining protection of thereflective film from UV initiated degradation.

Ultraviolet Absorbers.

Commercial mirror film constructions use broadband ultraviolet absorber(UVA) packages to provide UV resistance of the entire stack. In oneexample, the ultraviolet absorbing additives incorporated into anacrylic film are specifically designed for UV screening and are notrequired to protect the acrylic itself which is inherently UV stable. Inone example, the abrasion resistant coating (ARC) requires ultravioletabsorbers to give itself the long term weatherability required for usewith concentrating solar power collector applications. An added benefitof these ultraviolet absorbers is that some abrasion resistant coatingsexhibit nearly identical optical screening properties as the acrylicfilm. FIG. 8 shows the spectral hemispherical absorptance of tworeflective film constructions. One case (red line) shows the amount oflight absorbed by a laminated UV-screening acrylic film. The other case(blue line) indicates the amount of light absorbed by a UVA-containingARC coating. The difference in absorptance provides a measure of the UVscreening functionality of the respective screening layers. Atwavelengths below ˜365 nm the two curves overlay almost exactly,indicating that the ultraviolet absorber package used in the abrasionresistant coating provides UV screening nearly identical to the acrylicfilm over those wavelengths. Between ˜365-400 nm the spectral differencebetween the ARC vs. acrylic film is shifted by about 2.5 nm; such asmall shift at these higher UV wavelengths will generally have a minimaleffect on weatherability between these two screening layers.

A plot of spectral transmittance of an ARC coated onto quartz is shownin FIG. 9. FIG. 9 shows the spectral hemispherical transmittance with acut-off wavelength of about 385 nm. Very little structure is exhibitedthroughout the wavelength region of interest (λ>300 nm) except for afairly steep shoulder feature that separates a region that is highlyabsorbing vs. a region that is highly transmitting. The wavelength atwhich transmittance equals 50% is generally defined as the cut-offwavelength (λ_(CutOff)), below which transmittance rapidly drops to anear zero value. FIG. 9 indicates that the cut-off wavelength is about385 nm.

Materials, such as polymers having organic bonds that would otherwise besusceptible to photolytic damage, are thereby afforded some level of UVprotection. The cut-off wavelength of the acrylic film used in somereflective films is very close to 385 nm. FIG. 10 provides a list oftypical organic bonds and the associated wavelength required to breakthose bonds. Blanksby and Ellison present a more extensive discussionthat includes bond dissociation energies of more than 100 representativeorganic molecules. The molecular bond strength energy (E) and photonwavelength are related by:

λ=hc/E,  (1)

where h is Planck's constant and c is the speed of light. FIG. 10illustrates a number of organic bond strengths and corresponding photonwavelengths required to break them.

The degree of UV screening protection provided is a function of theoptical density of the film or coating. This property is controlled byBeer's Law:

α(λ)=∈(λ)·L·C,  (2)

where α(λ) is the spectral absorbance or optical density, λ iswavelength, ∈(λ) is spectral molar absorptivity or extinctioncoefficient, L is the thickness of the film or coating and C is theconcentration of ultraviolet absorbing additives. The amount oftransmitted light, τ, is related to the absorbance by:

τ(λ)=10^(−α(λ))=10^(−∈(λ)·L·C)  (3)

The extent to which UV photons are blocked or transmitted can thereforebe tailored or controlled in three ways. First, ∈(λ) is an inherentproperty of the type of UVA that is used. A wide variety of ultravioletabsorber packages exist. For example, the spectral properties ofdifferent types of commercial ultraviolet absorber products availablefrom Ciba Specialty Chemicals, a major international supplier of UVAadditives, are shown in FIG. 11. As can be seen, the cut-off wavelengthcan be shifted by choosing different types of ultraviolet absorberproducts.

Increasing the thickness of the coating or film will exponentiallydecrease transmittance at all wavelengths. This property can beachieved, for example by using increasingly thick acrylic films.Increasing thickness also increases the longevity of the screeningfunctionality. Successive layers of ultraviolet absorbers provideprotection for underlying absorber molecules, thereby allowingdownstream ultraviolet absorbers to survive longer.

Finally, greater loading results in higher concentration of ultravioletabsorbers and, consequently, lower transmittance. This can alsoeffectively shift the cut-off wavelength. For a given ultravioletabsorber package, higher concentration shifts the cut-off wavelength tohigher wavelengths. For example, FIG. 12 shows the spectraltransmittance properties associated with four ultraviolet absorberpackages. FIG. 12a shows the transmittance for abrasion resistantcoatings using several ultraviolet absorbers at 2% loading, and FIG. 12bpresents data for 4% loading. The cut-off wavelength of the A0111481 UVApackage shifts λ_(CutOff) from ˜390 nm at 2% to ˜400 nm at 4%.

Increased UV Reflectance.

The solar-weighted hemispherical reflectance (SWHR) can be increased byusing a modified ultraviolet absorber package that shifts λ_(CutOff) tolower wavelengths. ASTM G173 provides a typical/standard terrestrialsolar spectrum as shown in FIG. 14.

The percent of the terrestrial solar spectrum resource that can beregained by shifting the cut-off wavelength to lower wavelengths(P_(SR)) is the total amount of sunlight available below 385 nm (2.62%)times the power density between λ_(CutOff) and the cut-off wavelength ofprevious mirror film constructions (385 nm) divided by the total UVpower density between 300 and 385 nm (23.4 W/m²):

$\begin{matrix}{P_{SR} = \frac{2.62{\% \cdot {\int_{\lambda_{CutOff}}^{385\mspace{14mu} n\; m}{{I(\lambda)}d\; \lambda}}}}{\int_{300\mspace{14mu} n\; m}^{385\mspace{14mu} n\; m}{{I(\lambda)}d\; \lambda}}} & (4)\end{matrix}$

To obtain the percentage point increase in SWHR requires an inclusion ofthe spectral reflectance, ρ(λ), as part of the integrand:

$\begin{matrix}{P_{SWHR} = \frac{2.62{\% \cdot {\int_{\lambda_{CutOff}}^{385\mspace{14mu} n\; m}{{I(\lambda)}{\rho (\lambda)}d\; \lambda}}}}{\int_{300\mspace{14mu} n\; m}^{385\mspace{14mu} n\; m}{{I(\lambda)}d\; \lambda}}} & (5)\end{matrix}$

Results are plotted in FIG. 13, showing the percentage of theterrestrial solar spectrum regainable as a function of ultravioletabsorber cut-off wavelength, and the corresponding increase insolar-weighted hemispherical reflectance for the spectral reflectance ofCu/Ag/PET. As an example, λ_(CutOff)≈375 nm for the A0111261 and CyasorbUV1164L UVA packages shown in FIG. 12. If one of these ultravioletabsorber packages is used, an additional 0.5% reflectance is achieved.

Another target for λ_(CutOff) is 355 nm. As shown by its lightabsorption profile, polyethylene terephthalate (PET) absorbs in therange from 290 to 350 nm and, as it does, it degrades photolytically[Wypych]. It is hypothesized that the most critical region to protectvia the UV coatings is 300 to 345 nm. Thus, a cut-off wavelength of 355nm is feasible in terms of protecting both the underlying PET film andthe abrasion resistant coating as well. From FIG. 13, pushing the UVcut-off wavelength down to ˜355 nm allows recapture of ˜1.5% of theavailable solar resource, which translates into an increase in SWHR of˜1.3% (based on the spectral reflectance of typical Cu/Ag/PET reflectivefilm constructions).

REFERENCES

-   Kanouni, M., “Degradation and Stabilization of Organic Coatings”,    Ciba Specialty Chemicals presentation at NREL, Apr. 8, 2004.-   Blanksby, S. J., and Ellison, G. B., “Bond Dissociation Energies of    Organic Molecules”, Acc. Chem. Res., Vol. 36, 2003, pp. 255-263.-   Wypych, G., Handbook of Material Weathering, 2nd Edition, Chem Tech    Publishing, 1995, pp. 357-363.-   U.S. Pat. No. 4,307,150 for Weatherable Solar Reflector, issued on    Dec. 21, 1981.-   U.S. Pat. No. 4,645,714 for Corrosion-resistant Silver Mirror,    issued on Feb. 24, 1987.-   U.S. Patent Application Publication US 2012/0011850 for Broadband    Reflectors, Concentrated Solar Power Systems, and Methods of Using    the Same, published on Jan. 19, 2012.-   ASTM Standard D4060, “Standard Test Method for Abrasion Resistance    of Organic Coatings by the Taber Abraser”.-   ASTM G173, “Standard Tables for Reference Solar Spectral    Irradiances: Direct Normal and Hemispherical on 37° Tilted Surface”.

STATEMENTS REGARDING INCORPORATION BY REFERENCE AND VARIATIONS

All references throughout this application, for example patent documentsincluding issued or granted patents or equivalents; patent applicationpublications; and non-patent literature documents or other sourcematerial; are hereby incorporated by reference herein in theirentireties, as though individually incorporated by reference, to theextent each reference is at least partially not inconsistent with thedisclosure in this application (for example, a reference that ispartially inconsistent is incorporated by reference except for thepartially inconsistent portion of the reference).

The terms and expressions which have been employed herein are used asterms of description and not of limitation, and there is no intention inthe use of such terms and expressions of excluding any equivalents ofthe features shown and described or portions thereof, but it isrecognized that various modifications are possible within the scope ofthe invention claimed. Thus, it should be understood that although thepresent invention has been specifically disclosed by preferredembodiments, exemplary embodiments and optional features, modificationand variation of the concepts herein disclosed may be resorted to bythose skilled in the art, and that such modifications and variations areconsidered to be within the scope of this invention as defined by theappended claims. The specific embodiments provided herein are examplesof useful embodiments of the present invention and it will be apparentto one skilled in the art that the present invention may be carried outusing a large number of variations of the devices, device components,methods steps set forth in the present description. As will be obviousto one of skill in the art, methods and devices useful for the presentmethods can include a large number of optional composition andprocessing elements and steps.

All patents and publications mentioned in the specification areindicative of the levels of skill of those skilled in the art to whichthe invention pertains. References cited herein are incorporated byreference herein in their entirety to indicate the state of the art, insome cases as of their filing date, and it is intended that thisinformation can be employed herein, if needed, to exclude (for example,to disclaim) specific embodiments that are in the prior art. Forexample, when a compound is claimed, it should be understood thatcompounds known in the prior art, including certain compounds disclosedin the references disclosed herein (particularly in referenced patentdocuments), are not intended to be included in the claim.

When a group of substituents is disclosed herein, it is understood thatall individual members of those groups and all subgroups and classesthat can be formed using the substituents are disclosed separately. Whena Markush group or other grouping is used herein, all individual membersof the group and all combinations and subcombinations possible of thegroup are intended to be individually included in the disclosure. Asused herein, “and/or” means that one, all, or any combination of itemsin a list separated by “and/or” are included in the list; for example“1, 2 and/or 3” is equivalent to “‘1’ or ‘2’ or ‘3’ or ‘1 and 2’ or ‘1and 3’ or ‘2 and 3’ or ‘1, 2 and 3’”.

Every formulation or combination of components described or exemplifiedcan be used to practice the invention, unless otherwise stated. Specificnames of materials are intended to be exemplary, as it is known that oneof ordinary skill in the art can name the same material differently. Oneof ordinary skill in the art will appreciate that methods, deviceelements, starting materials, and synthetic methods other than thosespecifically exemplified can be employed in the practice of theinvention without resort to undue experimentation. All art-knownfunctional equivalents, of any such methods, device elements, startingmaterials, and synthetic methods are intended to be included in thisinvention. Whenever a range is given in the specification, for example,a temperature range, a time range, or a composition or concentrationrange, all intermediate ranges and subranges, as well as all individualvalues included in the ranges given are intended to be included in thedisclosure. It will be understood that any subranges or individualvalues in a range or subrange that are included in the descriptionherein can be excluded from the claims herein.

As used herein, “comprising” is synonymous with “including,”“containing,” or “characterized by,” and is inclusive or open-ended anddoes not exclude additional, unrecited elements or method steps. As usedherein, “consisting of” excludes any element, step, or ingredient notspecified in the claim element. As used herein, “consisting essentiallyof” does not exclude materials or steps that do not materially affectthe basic and novel characteristics of the claim. Any recitation hereinof the term “comprising”, particularly in a description of components ofa composition or in a description of elements of a device, is understoodto encompass those compositions and methods consisting essentially ofand consisting of the recited components or elements. The inventionillustratively described herein suitably may be practiced in the absenceof any element or elements, limitation or limitations which is notspecifically disclosed herein.

It must be noted that as used herein and in the appended claims, thesingular forms “a”, “an”, and “the” include plural reference unless thecontext clearly dictates otherwise. Thus, for example, reference to “alayer” includes a plurality of such layers and equivalents thereof knownto those skilled in the art, and so forth. As well, the terms “a” (or“an”), “one or more” and “at least one” can be used interchangeablyherein. It is also to be noted that the terms “comprising”, “including”,and “having” can be used interchangeably. The expression “of any ofclaims XX-YY” (wherein XX and YY refer to claim numbers) is intended toprovide a multiple dependent claim in the alternative form, and in someembodiments is interchangeable with the expression “as in any one ofclaims XX-YY.”

The terms and expressions which have been employed are used as terms ofdescription and not of limitation, and there is no intention in the useof such terms and expressions of excluding any equivalents of thefeatures shown and described or portions thereof, but it is recognizedthat various modifications are possible within the scope of theinvention claimed. Thus, it should be understood that although thepresent invention has been specifically disclosed by preferredembodiments and optional features, modification and variation of theconcepts herein disclosed may be resorted to by those skilled in theart, and that such modifications and variations are considered to bewithin the scope of this invention as defined by the appended claims.

1. A multilayer reflective film comprising: a metal layer; a polymericlayer; and an abrasion resistant layer above the polymeric layer;wherein the abrasion resistant layer has a cut-off wavelength less than385 nm, the cut-off wavelength being an ultraviolet wavelength of theterrestrial solar spectrum at which a transmittance value of theabrasion resistant layer is equal to fifty percent of a maximumtransmittance value of the abrasion resistant layer in the visibleregion of the terrestrial solar spectrum. 2-59. (canceled)
 60. Themultilayer reflective film of claim 1, further comprising an adhesivelayer, wherein: the metal layer is above an adhesive layer; and thepolymeric layer is above the metal layer.
 61. The multilayer reflectivefilm of claim 1, wherein: the metal layer is above the polymeric layer;and the abrasion resistant layer is above the metal layer.
 62. Themultilayer reflective film of claim 61, further comprising an adhesivelayer beneath the polymeric layer.
 63. The multilayer reflective film ofclaim 1, further comprising a backside metal protective layer below themetal layer.
 64. The multilayer reflective film of claim 1, furthercomprising an adhesion-promoting layer below the abrasion resistantlayer.
 65. The multilayer reflective film of claim 1, wherein theabrasion resistant layer has a cut-off wavelength selected from therange of 345 nm to 385 nm.
 66. The multilayer reflective film of claim1, wherein the abrasion resistant layer has a thickness selected fromthe range of 2 μm to 10 μm.
 67. The multilayer reflective film of claim1, wherein the abrasion resistant layer comprises one or moreultraviolet absorbing compounds having a cut-off wavelength less than385 nm, wherein the ultraviolet absorbing compound is selected from thegroup consisting of oxanilide, benzophenone, HP triazine, benzotriazole,formamidine and any derivatives of these.
 68. The multilayer reflectivefilm of claim 1, wherein the metal layer comprises a silver layer or amultilayer including a copper backside protective layer and a silverlayer.
 69. A method of making a multilayer reflective film, the methodcomprising the steps of: providing a polymer film; providing a metallayer; and providing an abrasion resistant layer above the polymer film;wherein abrasion resistant layer has a cut-off wavelength less than 385nm, the cut-off wavelength being an ultraviolet wavelength of theterrestrial solar spectrum at which a transmittance value of theabrasion resistant layer is equal to fifty percent of a maximumtransmittance value of the abrasion resistant layer in the visibleregion of the terrestrial solar spectrum.
 70. The method of claim 69,wherein the metal layer is provided onto a first side of the polymerfilm; an adhesive layer is provided onto the metal layer; and theabrasion resistant layer is provided onto a second side of the polymerfilm.
 71. The method of claim 69, wherein the metal layer is providedonto a first side of the polymer film; and the abrasion resistant layeris provided onto the metal layer.
 72. The method of claim 71, furthercomprising the step of providing an adhesive layer onto a second side ofthe polymer film.
 73. The method of claim 69, wherein the reflectivefilm is constructed using a roll-to-roll processing method.
 74. Amultilayer reflective film comprising: an adhesive layer; a metal layerabove the adhesive layer; a polymeric layer; and an abrasion resistantlayer above the polymeric layer; wherein: the abrasion resistant layerhas a cut-off wavelength less than 400 nm, and the abrasion resistantlayer has a transmittance of greater than or equal to 50% forelectromagnetic radiation having wavelength ranging from the cut-offwavelength to 2.5 μm.
 75. The multilayer reflective film of claim 74,wherein the abrasion resistant layer has a cut-off wavelength less than385 nm.
 76. The multilayer reflective film of claim 75, wherein: themetal layer is above an adhesive layer; and the polymeric layer is abovethe metal layer.
 77. The multilayer reflective film of claim 75,wherein: the metal layer is above the polymeric layer; and the abrasionresistant layer is above the metal layer.